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New bench-top deposition tools for SEM and TEM sample prep, plus R&D applications
The new HHV BT150 and BT300 are compact and economical bench top coating systems designed to suit the needs of electron microscopists and researchers.
Both systems are designed for ease of use and feature a full-colour, menu-driven, touch-screen control system for fully-automatic control. The control system can store up to 30 different process recipes for easy recall and can output process data to a separate device for storage.
In addition to EM applications, BT-series can also be configured for metals sputtering and metals evaporation for researchers.
BT-series systems can sputter non-noble metals such as aluminium where the turbo pump option is fitted.
BT150 for SEM and TEM sample prep
BT150 has comprehensive capability for EM sample preparation. It can be specified with vacuum pumps and process accessories to cover the requirements of users in busy EM labs. Options include:-
• Metal sputter source for SEM sample prep.
• Water cooled bias stage for SEM sample etch
• Resistance evaporation source for sample prep or research applications
• Carbon fibre source for ‘low vacuum’ TEM sample prep
• Carbon rod source for ‘high vacuum’ TEM sample prep
• Glow discharge accessory for modification of carbon films in TEM applications
• Integrated film thickness measurement and control system for repeatable performance from run to run
BT150 systems are fitted with an integrated source shutter.
Sample stages include a static SEM stub holder with water-cooling and etch, plus options for rotation and tilt. A planetary stub stage with adjustable tilt angle ensures that re-entrant samples are coated across their entire surface.
BT150 for research:
The versatile BT150 can also be used in research applications. The turbo-pumped version can sputter noble and non-noble metals and the system is offered with a 100mm diameter rotary stage for location of samples.
An optional resistance source allows coating of a range of materials onto small samples.BT150 research coaters can be specified with the integrated film thickness monitor and control system.
BT300 for research:
The BT300 research coater is specially designed for metal deposition onto larger samples. The system is offered with two sputter heads for sequential deposition of two metals, or with three sputter heads for sputtering a single metal onto a substrate up to 200mm diameter.
• Dual DC sputter sources for sequential deposition on samples up to 100mm diameter
• Triple DC sputter sources for metal deposition on samples up to 200mm diameter
• 100mm diameter rotary substrate stage, 150mm and 200mm diameter planetary stages
• Choice of rotary pump, dry scroll pump and turbo pumping systems
• Extended chamber height options
All BT300 series systems are fitted with a standard integrated source shutter.
Integrated film thickness monitoring
BT-series includes the option of a fully-integrated film thickness monitor system. The system is integrated into the touch-screen controller and provides control of the thickness of sputtered films. BT150 uses a single quartz crystal measurement head. The BT300 dual-sputter system uses two heads for accuracy.
Easy source change and automatic source recognition (BT150):
BT150 system features fast and easy source change. Deposition sources are quickly removed for re-loading or changing. BT150 features an automatic system which allows the system PLC to recognise the fitted source for correct operation.
Vacuum pumping options
The systems can be specified with an optional two-stage rotary pump for ‘everyday’ operation with carbon and noble metals. The turbo pump option provides additional vacuum performance those users requiring true high vacuum conditions. Sputter systems can sputter non-noble metals such as Al where the turbo pump option is specified.
BT-series can be specified with a dry-running scroll pump where oil-free vacuum is required.
Comprehensive safety and certification
BT150 and BT300 are provided with comprehensive safety systems and interlocks to provide protection for the user.
BT150 and BT300 are CE marked. UL-certification can be provided.
BT150 and BT300 Features and Specifications
Features
Ease of operation
Full colour, high resolution, touch screen control system
Recipe storage and editing for up to 30 processes
Process data output to mass storage device or PC
Optional integrated film thickness monitoring system
Complete range of deposition techniques
Metal sputtering techniques for SEM
Sample etch stage for SEM
Carbon fibre and carbon rod techniques for TEM
Glow discharge accessory for surface modification of carbon films for TEM
Resistance source option for metals deposition for EM and R&D
Sputter deposition of metals such as aluminium for R&D
Optional integrated film thickness monitoring and control system
Standard automatic shutter
Vacuum pumping
Rotary pump for ‘everyday’ low-vacuum EM coating
Turbo pump for high resolution EM coating and research coating
A comprehensive range of sample stages:
Water cooled SEM stage with bias operation
Rotary and tilting stages for EM stubs
Planetary / tilting stage for EM stubs
100mm diameter rotary stage for R&D (BT150)
Rotary and planetary stages for R&D up to 8” / 200mm diameter (BT300)
SPECIFICATIONS
| BT150 | |
| Control systems: | Integrated PLC with colour touch screen. Process menu selection and editing. Password protection. Data logging via external USB port. Automatic source recognition system |
| Chamber: | Glass cylinder 165mm diameter x 150mm tall with implosion guard. Optional 200mm tall chamber. |
| Vacuum pump: | 5m3/h two stage rotary pump |
| Turbo pump option: | 62l/s compound turbomolecular pump with on-board controller |
| Vacuum performance (rotary pump): | 5×10-2mbar in <3 minutes |
| Vacuum performance (turbo pump): | 5×10-5mbar in <8 minutes |
| Power input: | 100-230V, 50/60Hz, single phase |
| Process accessories | |
| Metal sputtering: | Single magnetron source. DC sputter power supply |
| Available targets: | Easy-change, Au, Au/Pd, Ir, Cu, Fe, others |
| Sputter options: | Sputters oxidising / non-noble metals where turbo pump fitted |
| Process gas admission: | Single channel pressure control system with chamber purge facility. Separate chamber vent. |
| Carbon fibre evaporation: | Pulse deposition with selectable current, time and degas mode |
| Carbon rod evaporation: | Pulse deposition with selectable current, time and degas mode |
| Glow discharge processing: | Glow discharge for carbon film modification |
| Resistance evaporation: | Single source and static sample stage for EM or research |
| SEM sample bias / etch stage: | Static, water-cooled bias stage with removable stub holder |
| Rotary EM stages: | Rotation, rotation with tilt, height adjustment for 6 stubs |
| Planetary EM stage: | Planetary motion with adjustable sample tilt for 6 stubs |
| Rotary stage for research: | 100mm diameter, plane stage with height adjustment |
| Film thickness monitoring and control: | Optional fully-integrated quartz crystal monitor with material selection menu, rate and termination control. Control through touch screen |
| BT300 | |
| Control system: | Integrated PLC with colour touch screen. Process menu selection and editing. Password protection. Data logging via external USB port |
| Chamber: | Glass cylinder 300mm diameter x 150mm tall with implosion guard. 200mm tall option |
| Vacuum pump: | 5m3/h two stage rotary pump |
| Turbo pump option: | 62l/s compound turbomolecular pump with on-board controller |
| Vacuum performance (rotary pump): | 5×10-2mbar in <12 minutes |
| Vacuum performance (turbo pump): | 5×10-5mbar in <20 minutes |
| Power input: | 100-230V, 50/60Hz, single phase |
| Process accessories | |
| Metal sputtering: | 2 targets for sequential deposition. DC sputter power supply and switching system |
| 3 targets for area coverage of 1 metal. Single DC sputter power supply | |
| Process gas admission: | Single channel pressure control system with chamber purge facility. Separate chamber vent |
| Sample stages: | 2-target systems have 100mm rotary stage which self-positions below the active source. |
| 3-target systems have a planetary stage with 150mm or 200mm diameter platen for optimum film uniformity | |
| Film thickness monitoring and control: | Optional fully-integrated quartz crystal system with material selection menu, deposition rate measurement and termination control. Controlled through the touch screen |
| Crystal holder: | 2-target systems have 2 crystal monitor heads. 3-target systems have 1 monitor head |
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