HEX

Benchtop or rack-mounted compact system

HEX-L

Larger mobile base-stand-mounted system

The HEX system offers a paradigm shift in compact yet versatile thin-film deposition. Whether you opt for the benchtop or rack-mounted configuration, this system redefines possibilities. Here are some key specifications:

• Maximum Sample Size Diameter: Accommodating up to 4 inches (100mm) of sample real estate, enabling diverse experimentation.
• Deposition Sources: A versatile setup featuring up to 3 deposition sources, expanding your capabilities.
• Chamber Volume: With a chamber volume of 12 liters (12L), the HEX system provides the space you need for your deposition endeavors.
• Base Pressure: Achieving an impressive base pressure of 9×10⁻⁷ mbar, ensuring a pristine environment for your thin-film work.
• Glovebox Integration: Seamlessly integrate the HEX system into your glovebox setup for controlled atmospheres.
• Loadlock Option: Enhance efficiency and reduce downtime with the convenient loadlock option.

The HEX system empowers your research and development with its compact design and powerful features, making it an ideal choice for various applications.

Step into a realm of expanded possibilities with the HEX-L, a mobile base-stand-mounted system designed for versatility. Here are the specifications that redefine your capabilities:

• Maximum Sample Size Diameter: Harness the power of larger samples, with the HEX-L accommodating up to 6 inches (150mm) in diameter.
• Deposition Sources: Expand your toolkit with up to 6 deposition sources, giving you unparalleled flexibility.
• Chamber Volume: With a substantial chamber volume of 50 liters (50 L), the HEX-L empowers your research with ample space.
• Base Pressure: Achieve and maintain a remarkable base pressure of 9×10⁻⁷ mbar, essential for pristine thin-film work.
• Glovebox Integration: Seamlessly integrate the HEX-L into your glovebox setup, providing controlled atmospheres for your experiments.
• Loadlock Option: Elevate efficiency and minimize downtime with the convenient loadlock option.

The HEX-L offers a dynamic platform to explore and innovate, making it the ideal choice for researchers and developers seeking versatility and excellence in thin-film deposition.