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Vendor: SAWATEC AG

iSPRAY-300

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Uniform coating of 3D microstructures

In conjunction with low-viscosity photoresists (e.g. Shipley 1813, AZ 4999, AZ 9260, TI Spray etc.) that are particularly suited for spray coating, the process-optimised spray nozzle generates extremely fine droplets. Spray coating takes place by means of a loop-shaped spray pattern in a closed process chamber, thus ensuring uniform coating across the entire substrate surface and a high level of repeatability. The spray nozzle spacing, which can be adjusted as a function of the process, improves the distribution of the spray coating for specific topographies and increases coating versatility. Both round and square substrates, up to 8 wafers at a time, can be coated.

The iSPRAY-300 spray coater is designed for wafers with a maximum diameter of 300 mm or for 12 × 12 inch substrates. The high-precision instruments are available as mobile cabinet.
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