Thin Film and Vacuum Infrastructure: What's Changing Underneath the Research
Join Ezzi Vision for a practical technical session exploring the shift toward modular, open-architecture PVD platforms and the latest capabilities in remote plasma sputtering and nanoparticle film deposition.
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Thin film research is shifting from single-purpose deposition tools toward modular, open-architecture PVD platforms. Using Korvus Technology’s HEX Series, we explore two emerging capabilities: Plasma Quest’s HiTUS, whose decoupled plasma source enables conformal coatings, low substrate damage, high-quality oxide/nitride films, and sputtering from thick magnetic targets; and Theris Nanotechnology’s UHV nanoparticle sources, producing distinct film morphologies unattainable through conventional evaporation or sputtering.
Practical Knowledge You Can Use
Technical insight from specialists working directly with industrial and scientific vacuum systems.
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Get practical advice from people experienced in industrial and scientific vacuum applications.
Improve System Performance
Understand factors that influence efficiency, reliability and long-term vacuum performance.
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Discuss relevant technical questions with the Ezzi Vision team during the live Q&A.
Built for Technical Professionals
Suitable for researchers and technical professionals working with thin-film deposition, vacuum systems and nanofabrication across laboratory, research and industrial environments.
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Webinar Recording
Recording will be available after the live session on 13 October 2026. Register above to receive the link once it is released.
COMING SOON
Thin Film and Vacuum Infrastructure: What's Changing Underneath the Research
Recorded 13 October 2026
Thin film research is shifting from single-purpose deposition tools toward modular, open-architecture PVD platforms. Using Korvus Technology’s HEX Series, we explore two emerging capabilities: Plasma Quest’s HiTUS, whose decoupled plasma source enables conformal coatings, low substrate damage, high-quality oxide/nitride films, and sputtering from thick magnetic targets; and Theris Nanotechnology’s UHV nanoparticle sources, producing distinct film morphologies unattainable through conventional evaporation or sputtering.
Recording available after the live webinar
The live session is on 13 October 2026 at 4:00 PM AEDT. Recording access will open after the session ends.
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Explore new developments in modular PVD systems, remote plasma sputtering and nanoparticle film deposition.
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