Vendor: SAWATEC AG

SMD-200/HP-200 duo

Name: SMD-200/HP-200 duo
Brand: SAWATEC AG
Availability: InStock

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Categories: Combined Systems, Lithography, Sawatec Systems

Description
Reviews

SMD-200/HP-200 duo
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Perfect couple for developing and baking

The combined systems SMD-200/HP-200 duo or SMD-200-E/HP-200 duo connect a Spin Developer with a Hotplate in one compact cabinet. These duo instruments are designed to clean, to develop or etch and bake wafers up to 8" (200 mm) or substrates up to 6 x 6" (150 x 150 mm).

The SMD developers by SAWATEC are convincing due to their high process performance, low chemical consumption as well as reliable repeatability, even with thick photoresist layers. Due to the user-friendly operation and easy cleaning, these instruments are ideally suited for laboratories, R&D, institutes and pilot projects.

The SAWATEC developers can be used for puddle or spray development, in which the optimum process being chosen based on application-technical and economic criteria. The advantage of the spray development compared to the puddle development is that very small fine structures can be released. The benefit of the puddle method is that significantly less developer solution is needed and better results are achieved when the substrate has deeper structures.

The Hotplate HP-200 was developed for precise soft bake and hard bake processes in lithography, in MEMS and similar applications. The temperature range is designed for up to 250 °C by default. The set temperature and the temperature profile have narrow margins, meaning that a high coating quality can be achieved. The HP series is convincing due to its high level of uniformity and the high-precision process repeatability. It can be used for substrates with a diameter of up to 200 mm and thicknesses of 14 mm at maximum (proximity/loading pins in the upper start position).