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Vendor: SAWATEC AG

Spin Module SM-200

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Categories: Lithography
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Optimal choice for semi-automatic coatings

The Spin Module SM-200 is the optimal choice for semi-automatic coating of thin layers. All commercial photoresists and coating materials can be coated homogeneously on wafers up to 200 mm (8 inches) or 150 x 150 mm (6×6 inches) substrates.

The Round-Closed Chamber Technology (RCCT) system effectively reduces air turbulence over the rotating substrate and improves coating uniformity by saturating the atmosphere with solvents faster in the closed chamber. This results in slower drying of the photoresist and a more homogeneous coating process with remarkable savings in consumed media.

The high-precision instruments are available as mobile cabinet and bench-mounted unit.
Authenticity Icon 100% Original and Quality
Guarantee Icon 24 Months Guarantee

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